The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 1987
Filed:
Jun. 21, 1984
William S Yerazunis, Troy, NY (US);
General Electric Company, Schenectady, NY (US);
Abstract
A method and system use a composite filter to produce a beam of light with patterns of different wavelength light mingled together in a controlled manner. The composite filter includes a first interference filter having a first interference pattern on a interference side of a first substrate and a second interference filter having a second interference pattern on an interference side of a second substrate. The first and second interference filters are bonded together with the first and second interference patterns abutting each other. The first interference pattern is made of interference material which passes visible light and reflects infrared light, whereas the second interference pattern passes infrared light and reflects visible light. The composite filter separates and light into alternate patterns of visible light and infrared light which are reflected from the surface of an object to generate surface measurement data. A method of making a composite filter creates a first interference pattern of interference material at the interference side of the first substrate and places second interference patterns of interference material at the interference side of the first substrate. The second interference pattern is on an interference side of a second substrate which is bonded to the first substrate. The first and second interference patterns are created by selective etching using masks and photolithographic techniques.