The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 1987
Filed:
Oct. 28, 1985
Applicant:
Inventors:
Hideaki Kamohara, Ibaraki, JP;
Kazumasa Fujioka, Ibaraki, JP;
Toshiaki Kobari, Ibaraki, JP;
Kunihiro Takahashi, Ibaraki, JP;
Shinjiro Ueda, Abiko, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ;
U.S. Cl.
CPC ...
118719 ; 118723 ; 118725 ; 118729 ; 118733 ;
Abstract
In a molecular beam epitaxy apparatus, the loading chamber for introducing the substrates is made separable from both the preparation chamber for cleaning the substrates and the growth chamber for forming thin films onto the respective substrates, so that the evacuation of the loading chamber is possible even when the loading chamber is separated from the apparatus, thus improving the productivity thereof.