The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 1987
Filed:
Dec. 26, 1984
Applicant:
Inventors:
Juro Endo, Kumagaya, JP;
Shiro Murakami, Kumagaya, JP;
Shigeo Fujii, Kumagaya, JP;
Masayuki Nakao, Kumagaya, JP;
Tsutomu Iimura, Tachikawa, JP;
Assignee:
Hitachi Metals, Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B / ;
U.S. Cl.
CPC ...
427129 ; 2041922 ; 427130 ; 427132 ; 428694 ; 428900 ;
Abstract
A manufacturing process of Co-Ni magnetic recording media by sputtering Co-Ni thin film layer on a substrate in Argon atomsphere including nitrogen and heating the thin film to evaporate nitrogen from the thin film to prepare the magnetic recording media appropriate for high density longitudinal recording, wherein on sputtering the substrate is maintained at a temperature of room temperature to 300.degree. C.
Endo, Juro. (1987). Process for manufacturing magnetic recording medium (U.S. Patent No. 4663193). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4663193
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile