The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 1987
Filed:
Apr. 15, 1985
Applicant:
Inventors:
Edward D Parent, Hamilton, MA (US);
Charles S Purinton, Byfield, MA (US);
Charles W Sutter, Spanaway, WA (US);
Assignee:
GTE Products Corporation, Stamford, CT (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B22F / ; C22C / ; C22C / ;
U.S. Cl.
CPC ...
419 10 ; 419 31 ; 419 33 ; 419 48 ; 419 60 ; 75230 ;
Abstract
A refractory metal silicide sputtering target is made by reacting refractory metal and silicon to about 70 to 90% completion of the reaction, comminuting the material, and then vacuum hot pressing the comminuted material to a high density compact having a theoretical density greater than about 95 percent and forming the metal silicide.