The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 1987
Filed:
Jan. 14, 1985
Chen-Shih Wang, Troy, MI (US);
Darrel S Nelson, Warren, MI (US);
General Motors Corporation, Detroit, MI (US);
Abstract
A method of forming perforations in polymer film includes the steps of forming a conductive film pattern on the film preferably in a bow tie shape using a material with a moderate resistivity and applying a microwave field across the film for a few seconds whereupon sufficient electrical energy is dissipated in the conductive spot to perforate the polymer. This method is operative even when the polymer film is laminated between layers of other dielectric material prior to the microwave processing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile