The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 1987
Filed:
Aug. 03, 1983
Michael Isaacson, Ithaca, NY (US);
Aaron Lewis, Ithaca, NY (US);
Cornell Research Foundation, Inc., Ithaca, NY (US);
Abstract
An optical system for determining and reproducing spatial separation of features in the range of 80.ANG. to 2500.ANG. for optical microscopy and lithography using visible light, the system being independent of the wavelength of the incident light. An aperture mask is provided having at least one aperture of between about 80.ANG. and 2500.ANG. diameter. The mask may be used in optical microscopy to view objects with a high degree of resolution by placing the mask within the near field of light emanating from a sample to be viewed. The mask may also be used for high resolution optical lithography by placing a resist material within the near field of light passing through the mask.