The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 1987
Filed:
Dec. 23, 1985
Masahiko Aoki, Kyoto, JP;
Nissin Electric Co., Ltd., Kyoto, JP;
Abstract
An apparatus for ion and vapor deposition comprises an ion implantation assembly including an ion source, a power supply for the ion source and an accelerator-injector for implanting ions from the ion source, a film forming assembly including an evaporation source and a power supply for the evaporation source, and a control assembly for controlling the two assemblies. The control assembly comprises means for maintaining ion implantation and vapor deposition in a specified ratio at all times when ion implantation and vapor deposition are effected at the same time and, which assures that ion implantation and vapor deposition are effected at the same time in a specified ratio to form a thin film of good quality and strong adhesion.