The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 1987
Filed:
Jun. 29, 1984
Marthe B Verney, Paris, FR;
Henri J Doucet, Les Molieres, FR;
Centre National de la Recherche Scientifique, Paris, FR;
Abstract
Negative ion source making it possible to produce an intense beam of negative ions, particularly of hydrogen and deuterium, as well as negative ions of other species. According to the main feature of this negative ion source, the number and distribution of the permanent magnets forming the magnetic multicusp confinement is chosen in such a way that the confinement time of the primary electrons is between 10.sup.-7 and 10.sup.-6 second and the thermionic electron emitters are located in the multicusp magnetic field between the saddle point of the magnetic field, formed by two adjacent permanent magnets and the center of the plasma in the vicinity of said saddle points. It is advantageously applied to the production of high-energy neutral atom beams used e.g. as an effective means for heating plasmas, produced in magnetic confinement fusion means.