The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 1987
Filed:
Mar. 31, 1986
Shuichi Matsuda, Itami, JP;
Akira Shigetomi, Itami, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A metal silicide photomask manufacturing process including a step of forming metal silicide film on a transparent silica glass substrate. A resist is applied onto the metal silicide film and then a patterning mask is drawn by using light or electron beam, followed by developing step, so that some portion of the applied resist can be removed wherein the metal silicide is exposed. Scum is removed by oxygen plasma etching process, thereby to form an oxide film on an exposed portion of the metal silicide. The left resist portion and the portion of the metal silicide film laying under the resist portion is etched away using a dry etching process in which the oxide film serves as a mask.