The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 1987
Filed:
May. 29, 1985
David H Hemming, Uithoorn, NL;
Peter G Turner, Vinkeveen, NL;
Koninklijke Emballage Industrie Van Leer B.V., Amstelveen, NL;
Abstract
Method for producing a reactively sputtered conducting transparent metal oxide film onto a continuous web moving in a sputtering chamber at a distance past a metal target. The target is arranged in combination with a counterelectrode powered such that a sputtering plasma discharge is generated inside the sputtering chamber transferring metal atoms from the target to the moving web. Oxygen is introduced into said chamber containing a low pressure atmosphere of an inert gas to produce a metal oxide coating. During the sputter process the surface resistance of the coating is continuously monitored at least at two areas across the width of the continuously moving web, whereby the sputtering conditions are controlled such that at least one area exhibits an optimum minimum resistance value.