The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 1987
Filed:
Feb. 26, 1986
David G Welkie, Chanhassen, MN (US);
Robert L Gerlach, Minnetonka, MN (US);
The Perkin-Elmer Corporation, Norwalk, CT (US);
Abstract
A plasma generating device, and in particular a duoplasmatron ion gun, is disclosed that is air cooled, high vacuum compatible and hence very clean with a stable ion current output. The device is mounted to a standard type flange held at ground potential without the necessity of subsequent high voltage isolation. Cooling is achieved with cooling fins and a fan inside a housing in which the duoplasmatron is mounted. A mounting structure includes a vacuum tight ceramic ring brazed between the mounting flange and the gun body. The ceramic ring is located with respect to high permeability magnetic components and a magnetic coil to facilitate a magnetic field for focusing the plasma, allowing the coil to be referenced to ground potential while the gun is maintained at high voltage. A ceramic chamber containing ceramic pellets is located in the plasma-forming gas inlet duct to prevent high voltage electrical discharge in the gas duct. A piezoelectric valve operated by a pressure sensor maintains accurate gas flow and ion output.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile