The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 1987
Filed:
May. 26, 1981
David C Boyd, Corning, NY (US);
Corning Glass Works, Corning, NY (US);
Abstract
A method of manufacturing a focusing shadow mask for a color cathode ray tube is disclosed in which two conductive plates or surfaces, forming the electrode structure, are secured together by insulating material so that they do not contact each other. Strips or columns of insulating material are accurately located with respect to the matrix of apertures formed in the focus mask by etching cavities which may be in the form of grooves within at least one of the plates forming the electrode structure between adjacent aperture areas, and filling such accurately positioned cavities with a dielectric frit material, and then after firing such frit material etching away the surface of the plate so as to provide raised strips or pillars of insulator material firmly bonded and embedded in the mask structure. Finally, a conductive surface film or second conductive plate is provided on the raised insulating frit material by depositing a film of conductive metallic material on the surface of the frit, such as aluminum deposited by an evaporation technique, or by bonding such second conductive plate to the surface of the insulating frit material.