The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 1987
Filed:
Sep. 09, 1985
Masao Totsuka, Ohmiya, JP;
Akiyoshi Suzuki, Tokyo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
Disclosed is an aligning apparatus in which two bodies such as a semiconductor mask and a wafer having elongate (or bar-like) alignment marks are scanned by a bar-like beam having an elongate irradiating area and further scanned by the bar-like beam with the direction of inclination thereof changed, and the positional relation between the two bodies is detected, whereby alignment of the two bodies is achieved. The bar-like beam is formed by an anamorphic optical system (for example, a cylindrical lens or the like). The bar-like beam scans the alignment marks through a beam scanning system, and the inclination of the beam is changed by beam inclination changing element at a desired time, for example, after the first cycle of scanning has been terminated, and then scanning is effected again.