The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 1987

Filed:

May. 10, 1985
Applicant:
Inventors:

Wilkie Y Chen, San Diego, CA (US);

Yen-Hwa L Hsu, Solana Beach, CA (US);

John R Purcell, San Diego, CA (US);

Assignee:

GA Technologies Inc., San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01F / ;
U.S. Cl.
CPC ...
335216 ; 335299 ;
Abstract

A magnet system for providing a substantially homogeneous magnetic field in a region. The magnet system includes a main coil and a pair of correcting coils with the main coil generating a magnetic field in a zone including the region. The correcting coils are at first and second locations in the zone and are connected to one another so that a magnetic field generated by the main coil will induce currents in the correcting coils which oppose one another. The correcting coils are constructed so that there will be no resultant current in them when there is generated substantially the same field strength of both of the first and second locations. Thus, the generation of differing magnetic field strengths at the respective locations effects generation of a resultant current in the correcting coil causing strengthening of the magnetic field at the location having the lesser magnetic field strength and weakening of the magnetic field at the other location, making the net field relatively homogeneous.


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