The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 1987
Filed:
Nov. 29, 1985
Kevin P O'Donnell, Wanamassa, NJ (US);
Other;
Abstract
A flat book-shaped substrate support electrode for a magnetically enhanced plasma processing apparatus has primary magnetic poles at first and second ends for generating a primary magnetic field that extends between the ends of the electrode in front of a processing surface of the electrode. An auxiliary magnet structure is spaced from the processing surface for generating an auxiliary magnetic field that tends to flatten the primary magnetic field. A diverter magnet generates a third magnetic field having curved lines of force centered on an axis spaced from a first edge of the electrode toward which electron drift occurs. The third magnetic field interacts with the resultant of the primary field and the auxiliary field at the first edge of the electrode and acts to stabilize the plasma in this region.