The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 1987

Filed:

Jul. 10, 1985
Applicant:
Inventor:

Maurice Halioua, Sea Cliff, NY (US);

Assignee:

New York Institute of Technology, Old Westbury, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356376 ; 2502 / ;
Abstract

Phase measurements of deformed grating images are used in performing improved optical profilometry. Individual line profiles are obtained at a series of rotational increments of a body. A full 360 degree surface profile, or a portion thereof, can then be generated.


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