The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 1987
Filed:
Feb. 18, 1986
Applicant:
Inventor:
Toshio Mori, Yokohama, JP;
Assignee:
Sony Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B / ; B05D / ;
U.S. Cl.
CPC ...
350400 ; 350401 ; 427105 ; 427163 ; 427164 ; 427166 ; 427167 ; 4272481 ; 427255 ;
Abstract
A novel process for producing a double refraction plate is disclosed. According to the process, a transparent dielectric material is directed to and deposited on a substrate from an oblique direction. Above all, for controlling the retardation of the resulting double refraction plate, a polarized light having a plane of polarization in a specific direction relative to the substrate is directed to the substrate through the variable phase plate and the light reflected from the substrate is observed through the variable phase plate, as the dielectric material is deposited from an oblique direction.