The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 1987

Filed:

Jul. 11, 1985
Applicant:
Inventors:

Noboru Kawai, Tokyo, JP;

Toshiro Abe, Tokyo, JP;

Kei Murata, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
156643 ; 156646 ; 156654 ; 1566591 ; 156663 ; 20419232 ; 430321 ; 430323 ; 430945 ;
Abstract

In a method of fabricating a master recording disc, a photoresist layer is formed on a glass substrate to form a master blank, which is revolved and exposed to an intensity-modulated laser beam so that a series of optically excited regions is formed in track turns in the photoresist layer. The optically excited regions are removed, forming a series of pits in the photoresist layer. An etchant gas is sputtered onto the master blank until the pits in the photoresist layer extend through the boundary surface of the photoresist layer and the glass substrate to a desired depth and pits having side walls tapered in a direction away from the boundary surface are formed in the substrate. The photoresist layer which remains on the glass substrate is finally removed.


Find Patent Forward Citations

Loading…