The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 1987

Filed:

Feb. 13, 1984
Applicant:
Inventor:

Ady Hershcovitch, Mount Sinai, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G21G / ;
U.S. Cl.
CPC ...
376130 ; 376915 ; 2504 / ;
Abstract

A process for selectively neutralizing H.sup.- ions in a magnetic field to produce an intense negative hydrogen ion beam with spin polarized protons. Characteristic features of the process include providing a multi-ampere beam of H.sup.- ions that are intersected by a beam of laser light. Photodetachment is effected in a uniform magnetic field that is provided around the beam of H.sup.- ions to spin polarize the H.sup.- ions and produce first and second populations or groups of ions, having their respective proton spin aligned either with the magnetic field or opposite to it. The intersecting beam of laser light is directed to selectively neutralize a majority of the ions in only one population, or given spin polarized group of H.sup.- ions, without neutralizing the ions in the other group thereby forming a population of H.sup.- ions each of which has its proton spin down, and a second group or population of H.sup.o atoms having proton spin up. Finally, the two groups of ions are separated from each other by magnetically bending the group of H.sup.- ions away from the group of neutralized ions, thereby to form an intense H.sup.- ion beam that is directed toward a predetermined objective.


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