The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 1987
Filed:
Dec. 19, 1984
Junichi Kitabayashi, Machida, JP;
Ricoh Company, Ltd., Tokyo, JP;
Abstract
A focusing method for interferometer wherein a light flux passing through a converter lens for converting the shape of wave fronts is caused to be incident on a tested surface and a testing light beam reflected by the tested surface is caused to be incident on a light receiving element capable of measuring the distribution of intensity of the light at least one-dimensionally. The tested surface is moved in the direction of its center axis until it reaches a position in which the vertex of the tested surface coincides with the focus of the converter lens and the output of the light receiving element shows a peak value, and the tested surface is further moved, from the position referred to hereinabove which serves as a reference position, in the direction of its center axis.