The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 1987
Filed:
Jul. 03, 1985
Applicant:
Inventors:
Assignee:
University of Salford, Salford, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G23C / ;
U.S. Cl.
CPC ...
204298 ; 250398 ; 20419211 ; 20419231 ; 20419232 ;
Abstract
Apparatus for and a method of modifying the properties of a material. A single ion beam from a source in a vacuum chamber is deflected by an electrostatic deflection system between a target and a substrate. When on the target, the beam sputters material therefrom on to the substrate. When on the substrate the beam bombards material previously deposited on it from the target which mixes it with the material of the substrate. A modified surface layer may therefore be achieved. The target and substrate may be moved relative to the beam if desired and the process may be monitored and controlled using appropriate sensors and controls.