The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 1987
Filed:
Mar. 06, 1986
Applicant:
Inventors:
Kailash C Jain, Sterling Heights, MI (US);
Bernard A MacIver, Lathrup Village, MI (US);
Assignee:
General Motors Corporation, Detroit, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
156628 ; 156653 ; 156657 ; 156651 ; 156644 ; 252 795 ;
Abstract
A method is provided for selectively etching ion-implanted silicon dioxide. A masked silicon dioxide layer is exposed to an ion beam of controlled dose and energy. The mask is removed and the silicon dioxide layer is brought in contact with an aqueous ammoniacal hydrogen peroxide solution which preferentially removes the ion-bombarded region with minimal etching of the unimplanted silicon dioxide.