The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 1987
Filed:
Nov. 26, 1984
Michel G Drouet, St-Bruno, CA;
Richard J Munz, Westmount, CA;
Hydro-Quebec, Montreal, CA;
Abstract
The disclosure describes a method and a system for treating gaseous effluents to remove impurities therefrom, these gaseous effluents flowing out from a high temperature reactor, into which a particulate material is being fed. The method comprises directing the flow of gaseous effluents counter-currently through the particulate material which is fed into the reactor, and independently controlling the particulate material feed rate and the velocity of the gaseous effluents so that particles in the gas feed are substantially all trapped by the particulate feed material and are returned to the high temperature reactor. Volatile materials may also be condensed on the particulate feed material. The purified gaseous effluents are then allowed to exit. A system for carrying out this method is also disclosed.