The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 1987
Filed:
Apr. 08, 1982
Applicant:
Inventor:
Masahiko Aiba, Nara, JP;
Assignee:
Sharp Kabushiki Kaisha, Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F04B / ;
U.S. Cl.
CPC ...
417540 ; 137568 ; 138 31 ;
Abstract
A ripple regulating system is disposed in a liquid supply system for minimizing pressure ripples generated by a pump employed in the liquid supply system. The ripple regulating system includes a pressure chamber of which one wall comprises a bellowphragm. A spring is secured to the bellowphragm to apply a predetermined pressure to the pressure chamber. A detection system is associated with the pressure chamber for detecting a balance pressure variation. When the balance pressure becomes higher than the preselected level, an adjusting system is operated to increase the depression pressure generated by the spring, thereby maintaining the constant flow rate supply.