The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 1987
Filed:
Mar. 03, 1986
Applicant:
Inventor:
Kevin A Muething, Lawrence Township, Mercer County, NJ (US);
Assignee:
AT&T Technologies, Inc., Berkley Heights, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118725 ; 118715 ; 118719 ; 118728 ;
Abstract
A chemical vapor deposition epitaxial reactor (10) comprised of a quartz tube (12) with banks of IR lamp proximate the outside surface thereof. A splitter plate (30) located at the inlet of the tube (12) separates reactive gases and nonreactive gases directed longitudinally into the tube. The nonreactive gases, directed along the inside surface of the tube (12), substantially prevents unwanted reactant deposition on the inside surface of the tube (12).
Muething, Kevin. (1987). Cvd apparatus (U.S. Patent No. 4651673). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4651673
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile