The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 1987
Filed:
Mar. 21, 1985
Benton C Clark, Littleton, CO (US);
Todd E Crumbaker, Fort Collins, CO (US);
Martin Marietta Corporation, Bethesda, MD (US);
Abstract
A projection system derived from certain solid geometrical properties using two aperture plates bearing arrays of holes with well defined spacing projects radiation from diverse sources such as electromagnetic radiation, visible and invisible light radiation, discrete particles, X-rays, gamma rays, charged and uncharged particles, as a multi-dot radiation image pattern onto a distant target, overcoming the enormous intensity losses inherent in prior art for pin hole projection of test patterns. The source angular emission function may be of nearly any type, from omni-directional (perfectly diffuse) to uni-directional. Such dot patterns are suitable for evaluating imaging systems as well as the critical operating parameters of mapping spectrometer sensors. The lensless projection system is capable of superimposing radiation source rays from every hole in the first aperture plate onto each image dot at the focal plane with dramatic increase in intensity of the projected image.