The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 1987
Filed:
Jan. 10, 1983
Applicant:
Inventor:
Antonius W De Laat, Eindhoven, NL;
Assignee:
U.S. Philips Corporation, New York, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430 16 ; 430320 ; 430324 ; 430394 ; 430945 ; 430326 ; 346 / ; 3461351 ;
Abstract
A method of manufacturing a metal matrix in which a supporting plate bearing a photo-resist layer is irradiated patternwise, the irradiated parts are developed and thereby removed, the obtained master disc is provided with a metal peel, which subsequently is removed, whereby after removal of the patternwise irradiated parts of the photoresist layer, the remaining parts are irradiated. The invention also relates to a new intermediate product which comprises a supporting layer, a photoresist layer having an information track and an electrically conductive layer on the photoresist layer, the photoresist layer being a fully irradiated layer.