The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 1987

Filed:

May. 06, 1986
Applicant:
Inventors:

Daniel Yakovlevitch, Bayside, NY (US);

Anthony J Rotolico, Hauppauge, NY (US);

Assignee:

The Perkin-Elmer Corporation, Norwalk, CT (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B23K / ;
U.S. Cl.
CPC ...
2191 / ; 2191 / ; 2191 / ; 219 75 ; 31323151 ;
Abstract

A gas distribution ring for a plasma gun comprises a ring member with two sets of gas inlet orifices extending from the outer surface inwardly through the ring member. The outer surface has an undulated groove for an O-ring formed therein, and the orifices are positioned with respect to the undulated O-ring such that one set of orifices are isolated on one side of the O-ring and the other set of orifices are isolated on the other side of the O-ring. In a preferred embodiment the orifices of one set are radial with respect to the axis of the ring, and the orifices on the other side of the undulated O-ring have a tangential component to provide vortical gas flow in the arc region of the gun. The gas distribution ring positioned in the plasma spray gun permits a simple choice between radial and vortical flow in the arc region of the gun, without alteration of the gun.


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