The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 1987
Filed:
Jul. 22, 1985
Applicant:
Inventor:
Kiyoshi Oguchi, Sayama, JP;
Assignee:
Dai Nippon Insatsu K.K., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ; G03F / ;
U.S. Cl.
CPC ...
430323 ; 430313 ; 430325 ; 430331 ; 430270 ; 430296 ; 430942 ; 430945 ; 430966 ; 156646 ; 156643 ;
Abstract
An acetalized polyvinyl alcohol having a molecular weight of 10,000 to 1,000,000 represented by the formula ##STR1## wherein: R.sup.1 represents a residue of an aldehyde or a ketone the residue having no photosenitivity to ultraviolet rays; R.sup.2 represents a hydrogen atom, which may partially be substituted with an acetyl group; R.sup.3 represents naught or a monomeric unit copolymerizable with vinyl acetate; and l, m, n, are integers indicating polymerization degrees, has excellent characteristics such as high sensitivity, high resolving power and excellent dry etching resistance and is suitable as a negative-type resist in ionizing radiation lithography.