The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 1987
Filed:
Apr. 01, 1985
Jonathan J Kim, Williamsville, NY (US);
Joel D Katz, Los Alamos, NM (US);
Kennecott Corporation, Cleveland, OH (US);
Abstract
A system to prevent, retard or reverse the decomposition of silicon carbide articles during high temperature plasma sintering. Preferably, the system comprises sintering a silicon carbide refractory or ceramic green body in a closed sintering environment, such as a covered crucible, with strategic placement of the plasma torch or torches, exhaust outlet and crucibles. As sintering proceeds, a silicon vapor pressure builds up within the crucible, retarding the decomposition of the silicon carbide body. The plasma torch, exhaust outlet, and crucibles are positioned so that buoyant convective flow is maximized to increase the heat transfer and energy efficiency. In another embodiment, a 'sacrificial' source of silicon carbide is placed into the sintering furnace. The silicon carbide in the sacrificial source starts to decompose before the silicon carbide refractory or ceramic article, creating a supersaturated atmosphere of silicon vapor species in the furnace. This prevents, retards or reverses the silicon carbide decomposition reactions and thus maintains the integrity of the refractory or ceramic article being sintered. Preferably, the sacrificial source is placed in a closed sintering environment along with the silicon carbide article being sintered.