The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 03, 1987

Filed:

Sep. 11, 1985
Applicant:
Inventors:

Muneharu Makita, Takatsuki, JP;

Jun-ichi Maeno, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
526206 ; 526210 ; 526306 ; 5263171 ;
Abstract

A process for preparing a highly water-absorbent resin by a reversed-phase suspension polymerization method using an aqueous solution of a monomer containing an alkali metal salt of acrylic or methacrylic acid, water-soluble polymerization initiator, protective colloid, hydrophobic organic solvent and if required, dispersing agent, the process being characterized in that the protective colloid is a copolymer comprising: (A) about 50 to about 97 mole % of styrene and/or alkyl-substituted derivative thereof, (B) 0 to about 50 mole % of dialkylaminoalkyl acrylate or methacrylate and/or dialkylaminoalkyl acrylamide or methacrylamide, (C) about 3 to about 15 mole % of glycidyl acrylate and/or glycidyl methacrylate and (D) 0 to about 30 mole % of an unsaturated monomer which can be copolymerized with the component A, B or C.


Find Patent Forward Citations

Loading…