The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 1987
Filed:
Jun. 28, 1985
Juergen Petermann, Buxtehude, DE;
Harald Fuchs, Thalwil, CH;
BASF Aktiengesellschaft, , DE;
Abstract
A resist image is produced from a high-resolution, radiation-sensitive resist material by a process in which paraffin is applied as a resist material in a thin layer onto a substrate and irradiated in a predetermined pattern, for example by means of an electron beam, with crosslinking, and the non-irradiated, non-crosslinked parts of the resist layer are then removed. Particularly advantageously, the resist layer consisting of the paraffin is applied onto the substrate by vapor deposition and, after imagewise irradiation, the non-irradiated parts of the resist layer are removed by evaporation in order to develop the resist image.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile