The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 1987
Filed:
Mar. 12, 1986
Applicant:
Inventors:
Hiromi Yamakita, Asahi, JP;
Kiyoshi Hayakawa, Gifu, JP;
Masato Tazawa, Nagoya, JP;
Hiroshi Taoda, Nagoya, JP;
Assignees:
Agency of Industrial Science & Technology, Tokyo, JP;
Ministry of International Trade and Industry, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C25B / ;
U.S. Cl.
CPC ...
204 / ; 204 72 ; 2041577 ; 252500 ; 252518 ; 427 531 ;
Abstract
On a silicon semiconductor or a silicon semiconductor having a coating of a noble metal, a polymer film is deposited by immersing the silicon semiconductor or the silicon semiconductor with the noble metal coating in a solution containing a thiophene compound, applying a voltage to the silicon semiconductor as an electrode and, at the same time, exposing the silicon semiconductor to light.