The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 1987

Filed:

May. 01, 1986
Applicant:
Inventors:

John M Shannon, Whyteleafe, GB;

John A Slatter, Crawley, GB;

David J Coe, East Grinstead, GB;

Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
357 15 ; 357 22 ; 357 16 ; 357 55 ; 357 54 ; 357 90 ; 357 53 ;
Abstract

Separate areas of an active unipolar barrier, e.g. a Schottky barrier, of a semiconductor device are located between closely-spaced field-relief regions which provide the device with an improved voltage blocking characteristic. The flow of minority carriers into the adjacent body portion under forward bias is restricted by providing, at least at the areas of the field-relief regions, a layer of different material from that of the body portion and from that of the unipolar barrier-forming means. The layer of different material may form a high-impedance electrical connection with the field-relief regions, and/or it may form with the body portion a heterojunction such as, for example, a Schottky barrier of higher barrier height, a barrier between different band gap materials or a MIS structure, which heterojunction forms part of the field-relief regions.


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