The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 1987
Filed:
Feb. 01, 1985
Applicant:
Inventors:
Shiro Murakami, Kumagaya, JP;
Shigeo Fujii, Kumagaya, JP;
Masayuki Nakao, Kumagaya, JP;
Yoshio Igarashi, Kumagaya, JP;
Juro Endo, Kumagaya, JP;
Assignee:
Hitachi Metals, Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B / ;
U.S. Cl.
CPC ...
427128 ; 427129 ; 427130 ; 428694 ; 428900 ;
Abstract
A manufacturing process of Co-Ni magnetic recording media by sputtering Co-Ni thin film layer on a substrate in Argon atmosphere including oxygen or air and heating the thin film to evaporate oxygen or air from the layer to prepare the magnetic recording media appropriate for high density longitudinal recording, wherein on sputtering the substrate is maintained at a temperature of room temperature to 300.degree. C.