The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 1987
Filed:
Aug. 01, 1983
Kenji Yamada, Narashino, JP;
Nippon Kogaku K. K., Tokyo, JP;
Abstract
In an apparatus for measuring the optical characteristics of an optical system to be examined a light source determines a reference optical axis and generates a light beam that is passed through the optical system to be examined along the reference optical axis. A mask partly transmits the light beam therethrough and has a pattern comprising at least one straight line disposed off the reference optical axis in the light beam, the straight line of the pattern extending in a predetermined direction in a plane substantially orthogonal to the reference optical axis. A photosensitive detector receives the light beam passed through the optical system to be examined and the mask. The detector is fixedly disposed relative to the mask and has a substantial length in a direction substantially orthogonal to the reference optical axis and the straight line of the pattern. The detector produces an electrical signal indicative of the position of the pattern of the mask projected onto the detector in the direction of the length of the detector. A rotator provides relative rotation about the reference optical axis between the light beam passed through the optical system to be examined and the mask. A signal processor processes the electrical signal and finds the refractive characteristic of the optical system to be examined. -