The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 1987
Filed:
Jul. 29, 1985
Yasuhito Yoshimi, Kyoto, JP;
Dainippon Screen Mfg. Co., Ltd., Kyoto, JP;
Abstract
A treatment tank in photosensitive material processing system or the like is equipped with a plurality of overflow devices and a partition member for separating liquid surface part extending at least to one overflow device from the other, below the liquid surface with at least one opening or gap allowing the treatment liquid to flow from side of the partition, and with the partition member solution in the middle and deep region of the tank passes through the opening or gap to flow over insoluble solids being suspended therein.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile