The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 03, 1987

Filed:

Jan. 17, 1985
Applicant:
Inventors:

Yoshio Itoh, Tokyo, JP;

Hiroshi Ohtsuka, Tokyo, JP;

Tadashi Nishimuro, Tokyo, JP;

Norio Moriyama, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ; G03F / ;
U.S. Cl.
CPC ...
430323 ; 430 22 ; 430324 ; 356401 ;
Abstract

An alignment mark formed on a semiconductor wafer is disclosed. The mark comprises a mark member provided on a base region and a reflection changing portion provided on the mark member. The reflection changing portion has slightly inclined side walls.


Find Patent Forward Citations

Itoh, Yoshio. (1987). Alignment mark on a semiconductor and a method of forming the same (U.S. Patent No. 4640888). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4640888

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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