The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 1987
Filed:
Dec. 06, 1984
Applicant:
Inventor:
Noboru Sato, Kanagawa, JP;
Assignee:
Sony Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
2041922 ;
Abstract
A method for producing a magnetic medium which includes the steps of sputtering a magnetic material containing iron onto a substrate in an atmosphere of argon gas mixed with nitrogen gas and depositing a magnetic film on the substrate. The nitrogen is preferably present in an amount of 10 to 10000 ppm and serves to increase the saturation intensity of magnetization. The preferred version of the method consists in jointly sputtering a rare earth metal and an iron-cobalt.