The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 1987
Filed:
Jun. 22, 1984
Applicant:
Inventors:
Edward C Fredericks, Haymarket, VA (US);
Madan M Nanda, Reston, VA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; B44C / ;
U.S. Cl.
CPC ...
156656 ; 156657 ; 1566591 ; 156662 ; 430314 ; 430317 ; 427 90 ; 357 67 ;
Abstract
In a photoresist lift-off process for depositing metal on a semiconductor substrate, a protective coating of silicon is applied to an etched via hole prior to the metal deposition step. This prevents the formation of contaminant trapping voids and contaminated chemical residues which would otherwise occur at the base of the metal line subsequently deposited in the bottom of the via hole. The protective silicon layer, which has a thickness of from 100 to 300 angstroms, remains intact as a permanent part of the structure.