The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 1987
Filed:
Apr. 18, 1986
Alfred R Dozier, San Diego, CA (US);
Other;
Abstract
A chemical vapor deposition reactor for deposition on substrates, for example silicon epitaxial depositions. The apparatus includes a heating chamber in which a reactor is placed. Means of heating the substrates in the reactor is spaced from the reactor. The reaction chamber is positioned in the heating chamber. It has a load/unload opening outside of the heating chamber and an exhaust port. A reactant distribution means receives and discharges reactants into the reaction chamber. A wafer carrier holds a plurality of wafer retainers. It is moved in and out of the reaction chamber by moving means. A seal closes the reaction chamber opening when the wafer carrier is placed in the reaction chamber. A conditioning chamber is located adjacent to the reaction chamber and includes a door. Preconditioning of the wafers before introduction in to the reaction chamber, and subsequent cooling outside of the reaction chamber, can be accomplished in the conditioning chamber.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile