The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 1987
Filed:
Jun. 11, 1985
Michihiko Asai, Ibaraki, JP;
Yukio Shimura, Kanagawa, JP;
Keishiro Tsuda, Ibaraki, JP;
Susumu Ueno, Ibaraki, JP;
Hirokazu Nomura, Ibaraki, JP;
Kiyoshi Imada, Saitama, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
The invention provides a very efficient method for the improvement of the antistatic performance, e.g. decrease in the accumulation of static electricity on the surface and decrease in the surface resistivity, of a synthetic resin shaped article with outstanding durability of the effect. The method comprises two steps in principle, first of which is the formation of a crosslinked layer in the surface portion of the shaped article by a variety of known methods effective for the formation of crosslinks in polymeric materials and the second of which is the exposure of the thus crosslinked surface of the article to low temperature plasma produced in an atmosphere containing a gaseous silicon-containing compound which may be a silane compound or a low-molecular weight vaporizable siloxane compound to form a plasma-polymerized surface film of the silicon compound on the crosslinked layer.