The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 1987
Filed:
Dec. 10, 1985
Jack Beery, Fremont, CA (US);
Barry G Broome, Glendora, CA (US);
ITT Corporation, New York, NY (US);
Abstract
Apparatus is described for exposing a layer of photosensitive material to form an image thereon, by passing the photosensitive layer under a row of closely spaced light shutter apertures which are selectively opened and closed. The total light falling on each pixel area at the photosensitive layer is increased by using apertures which are long and thin, and concentrating the light passing therethrough onto a pixel at the photosensitive layer. Two rows of staggered apertures are used. The photosensitive layer is on a transparent substrate, and a reflector lies on a side of the substrate opposite the light apertures, so light passing through the photosensitive layer and substrate is reflected back through the layer to pass twice therethrough. The entire sheet is pre-exposed to light of a level less than a threshold, with the light subsequently passing through each light aperture being sufficient to raise the total exposure beyond the threshold.