The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 20, 1987

Filed:

Aug. 26, 1983
Applicant:
Inventor:

Frank S Gutleber, Little Silver, NJ (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04B / ; H01Q / ;
U.S. Cl.
CPC ...
342383 ; 342384 ; 342367 ;
Abstract

A relatively narrow beamwidth (10.degree. or less) receiving antenna patt is formed at the receiver end of a radio frequency transmission link where a plurality of radiating sources are operating in a dense communications environment. The antenna pattern comprises the difference between two antenna receiving patterns where the beamwidth of one pattern is wider by a predetermined angular amount than the other pattern. In the preferred embodiment, a phased linear array of antenna elements is operated as two sets of elements wherein one set of elements comprising a number of elements less than the total number of elements provides a beamwidth that is broadened by a predetermined angular sector greater than the beamwidth formed by the entire array. The antenna elements are progressively phase shifted to provide overlapping beam patterns and the pattern of one set of elements is scanned so that one side of both patterns are substantially coincident. The received signals from the elements developing the two antenna patterns are respectively combined and linearly subtracted to provide cancellation of all the received radiation except over the small angular sector defined by the difference between the two patterns.


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