The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 1987
Filed:
Jan. 28, 1985
Georges Slodzian, Sceaux, FR;
Francois Costa De Beauregard, Paris, FR;
Bernard Daigne, Chatenay Malabry, FR;
Francois Girard, Paris, FR;
Office National d'Etudes et de Recherche Aerospatiales (ONERA), Chatillon, FR;
Universite de Paris-sud, Orsay, FR;
Abstract
Between the electrostatic sector (SE 23) and the magnetic sector (SM 30) of a mass spectrometer, there is provided a quadrupole (QP 26) which applies parallel beams to the magnetic sector whose inclination depends on the energy dispersion of the particles. A slotted lens (LF 27) corrects the divergence of the quadrupole in the perpendicular plane. A suitable relationship between the angle of the inlet face of the magnetic sector (SM 30) and the deflection angle provided thereby ensures that the second order aperture aberrations of the magnetic sector are corrected. The chromatic aberrations may be corrected by means of a hexapole (HP 25) centered on the focus of the quadrupole (QP 26). Another hexapole (HP 22) placed upstream from the electrostatic sector (SE 23) level with a constriction in vertical section of the particle beam serves to correct second order aperture aberrations related to the electrostatic sector (SE 23).