The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 13, 1987

Filed:

Nov. 27, 1985
Applicant:
Inventors:

Jan W Slotboom, Eindhoven, NL;

Henricus G Maas, Eindhoven, NL;

Johannes A Appels, Eindhoven, NL;

Francois M Klaassen, Eindhoven, NL;

Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
357 24 ; 357 59 ;
Abstract

In a semiconductor device, for example a SPS memory having narrow coplanar silicon electrodes, the electrodes are formed by etching grooves or slots having a width in the submicron range into a polycrystalline silicon layer with the slot width being defined by the oxidized edge of a silicon auxiliary layer. The electrodes are alternately covered by silicon oxide and by a layer comprising silicon nitride. The covered electrodes are first interconnected pairwise, whereupon they are separated from each other, and are provided with self-aligned contact windows. Thus, the very narrow electrodes can be contracted without technological problems and memory cells of very small dimensions are provided.


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