The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 1987
Filed:
Nov. 15, 1984
Applicant:
Inventor:
N Balasubramanian, Saratoga, CA (US);
Assignee:
Matrix Instruments Inc., Orangeburg, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B / ; H04N / ;
U.S. Cl.
CPC ...
356 71 ; 356376 ; 358111 ;
Abstract
A method for reading deformation images recorded on electrophotographic media involving scanning of an image surface and measuring microscopic surface tilt in a reflected beam. In one embodiment, the deformation image is scanned telecentrically and in another embodiment the surface is scanned with a beam at angles to the surface. By intercepting the retroflected beam and measuring the deviation of the reflected beam from the scanning center, a number of proportional-to-surface tilt is found. By then electrically integrating over neighboring regions, an electrical or optical pattern, reimaging the deformation image, may be constructed.