The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 1986
Filed:
Apr. 16, 1985
Mitsui Toatsu Chemicals, Inc., Tokyo, JP;
Abstract
A process is provided herein wherein a solid polymer slurry diluted with a specific diluent is continuously discharged under controlled conditions from a high pressure zone to a low pressure zone substantially maintained at atmospheric pressure and the slurry is then separated into said diluent and dried polymer, the improvement wherein the discharged amount of the solid polymer slurry is strictly controlled by varying the heat in the second zone and simultaneously adding a diluent which is gaseous under normal temperature and pressure so that by the control of these two perimeters a continuous slurry discharge can be maintained at predetermined levels.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile