The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 1986
Filed:
Jul. 13, 1984
Applicant:
Inventor:
Roland Thoms, Mullheim, DE;
Assignee:
BMC Industries, Inc., St. Paul, MN (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F / ; B44C / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
156644 ; 156640 ; 156651 ; 156656 ; 1566611 ; 313402 ; 430 23 ; 430312 ; 430313 ; 430318 ;
Abstract
The process of forming a plurality of openings in an aperture mask by applying a layer of etchant resist to opposite surfaces of an aperture mask material, determining an overetch factor for the aperture mask, laying out a pattern of openings in the etchant resist on one side of the aperture mask, laying out a pattern of openings in the etchant resist on the opposite side of the aperture mask wherein the size of the openings on one side of the mask in the etchant resist increase while the size of the openings in the etchant resist on the opposite side decrease, and etching the aperture mask material through the openings in the etchant resist.