The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 1986
Filed:
Mar. 12, 1985
Applicant:
Inventors:
Taizan Goto, Numazu, JP;
Isao Sekiya, Numazu, JP;
Assignee:
Toshiba Machine Co. Ltd, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118730 ; 118715 ; 118733 ;
Abstract
A barrel-type epitaxial vapor phase growing apparatus in which a susceptor for mounting wafers to be treated on a plurality of plates is rotatably hung by a rod inside a bell jar. Purge gases are supplied to the casing housing the drive mechanism and a baffle directs the gases along the rod and into the susceptor. The purge gases carry dust which is thus kept away from the wafers on the outside of the susceptor as it passes through the susceptor to an exhaust at the lower end of the reaction chamber. The flowing purge gases also cool the susceptor more quickly after treatment.